Thin Film Shape Memory Alloys: Fundamentals and Device by Shuichi Miyazaki, Yong Qing Fu, Wei Min Huang

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By Shuichi Miyazaki, Yong Qing Fu, Wei Min Huang

This ebook, the 1st devoted to this interesting and quickly growing to be box, permits readers to appreciate and get ready top quality, high-performance TiNi form reminiscence alloys (SMAs). It covers the houses, practise and characterization of TiNi SMAs, with specific concentrate on the most recent applied sciences and functions in MEMS and organic units. simple thoughts and idea are coated to introduce new-comers to the topic, while a number of sub-topics, akin to movie deposition, characterization, put up therapy, and making use of skinny motion pictures to functional events, attract extra knowledgeable readers. each one bankruptcy is written by means of professional authors, supplying an summary of every subject and summarizing the entire most modern advancements, making this a fantastic reference for practitioners and researchers alike.

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Extra info for Thin Film Shape Memory Alloys: Fundamentals and Device Applications

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The strain eR associated with the R-phase transformation is also shown in Fig. 6. 26 % which is one tenth of eA. 1 Calculated martensite transformation strains along specific orientations [Miyazaki & Ishida, 1999 [6], with permission from Elsevier]. Q. 9at%Ni thin film [Miyazaki & Ishida, 1999 [6], with permission from Elsevier]. stress of about 175 MPa, eR starts to decrease with a further increase in applied stress. The major reason for the increase in eR prior to the maximum point is that the most preferential variant grows with increase of the applied stress, while the major reason for the decrease in eR after reaching the maximum point is that the temperature range where the R phase can exist becomes narrower with increase of the applied stress, so that the lattice distortion of the R phase becomes less, as shown in Fig.

9at%Ni thin film [Miyazaki & Ishida, 1999 [6], with permission from Elsevier]. Q. Q. 9at%Ni thin films [Miyazaki & Ishida, 1999 [6], with permission from Elsevier]. keeps the Ni-content of the matrix in equilibrium. Hence the transformation temperatures are insensitive to the nominal composition of the Ni-poor thin films. However, since as-sputtered thin films are amorphous in Ni-poor (or Ti-rich) films, if the heat-treatment is not sufficient to achieve an equilibrium condition, a non-equilibrium condition can exist so that transformation temperatures and shape memory behavior will show sensitivity to heat treatment.

Miyazaki, Y. Q. Fu and W. M. 6 ks; (h) 36 ks and (i) 360 ks [Miyazaki & Ishida, 1999 [6], with permission from Elsevier]. 6 ks; the foil normal is nearly parallel to [ 111 ]B2 in (a) and exactly parallel to [ 111 ]B2 in (b) [Miyazaki & Ishida, 1999 [6], with permission from Elsevier]. 6 ks. The solid lines show the DSC curves measured upon cooling, while the dashed curves show those upon heating. Solution treated film (X ¼ 0) shows no transformation peak upon cooling in the DSC curve, indicating that the transformation temperatures are very low, hence again there is no reverse transformation peak upon heating.

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